Plasma glow discharge is a versatile tool especially suitable for the chemical surface modification of polymeric membranes. Using this technique, etching, (regioselective) functionalization or deposition of a thin film in the nanometer range is possible with only a very tiny consumption of precursor chemicals. In this way the pore size of asymmetric membranes can be influenced in a defined manner by etching or plasma polymerization to adjust the filtration characteristics or to create a closed pinhole-free thin film with an adjustable crosslink density to create a solvent-stable permselective layer for the separation of organic vapors or solvents.